Templated Self-assembly through Restricted Geometry


  • Integrated Circuit Fabrication
  • Biomolecule Arrays or Sensors
  • Nanowire growth
  • Graphene Patterning
  • Computational Material Development
  • Sub-wavelength photonics

Problem Addressed

The fabrication of dense, defect free, and arbitrary nanopatterns over a large area is crucial
for semiconductor manufacturing technology or microarray technology, but the
current methods of photolithography and electron beam lithography are limited
by low resolution and low throughput, respectively.


The technology uses a template with restricted geometrical features in order to constrain and determine allowed block copolymer patterns. The template is made from a square lattice to which the block copolymer must conform. By dividing up the target pattern into a grid of allowed block copolymer patterns, this process simplifies the necessary template design for achieving complex nanopatterns.


  • Design principle based on a square lattice with a grid simplifies template design
  • With this design principle, block copolymer pattern can be predicted with high accuracy