This technology suites a vast range of photonic and optoelectronic devices and systems, such as optical delay lines, optical buffers, optical memories, light emitting diodes, solar cells, thermovoltaic devices, and lasers.
The main issue with modern photonic systems is the necessity to operate as a substantially perfect light-guiding system by supporting, over a large frequency bandwidth, subwavelength modes of small velocity and small attenuation, both substantially devoid of frequency dispersion.
Also, many important modern optical systems, in particular those requiring slow or stopped subwavelength light, can be implemented only with suboptimal, dispersion-limited operation.
This invention provides a linear, passive material system. The structure includes a plasmonic material region and a dielectric material region, disposed adjacent to a selected surface of the plasmonic material region. At least one of the plasmonic material region and the dielectric material region have a dielectric permittivity distribution that is specified as a function of depth through the corresponding material region.
- Enables prespecified tailoring of the optical dispersion relation of the system to achieve, for a supported surface, plasmon polariton, a desired propagation characteristic
- Resulting from permittivity distribution, the invention enables customization of aspects of a dispersion relation to obtain prespecified propagation SPP characteristics