Epitaxial Growth and Transfer via the Patterned Layered Material Coated Crystalline Substrate for Wafer Recycling
Embodiments including apparatus, systems, and methods for nanofabrication are provided. In one example, a method of manufacturing a semiconductor device includes forming a two-dimensional (2D) layer comprising a 2D material on a first substrate and forming a plurality of holes in the 2D layer to create a patterned 2D layer. The method also includes forming a single-crystalline film on the patterned 2D layer and transferring the single-crystalline film onto a second substrate.
Researchers
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epitaxial growth and transfer via patterned two-dimensional (2d) layers
United States of America | Published application
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