Integrated Visible Light-Emitter Arrays on Silicon
Methods and structures for monolithically integrating monocrystalline silicon and monocrystalline non-silicon materials and devices are provided. In one structure, a semiconductor structure includes a silicon substrate and a first monocrystalline semiconductor layer disposed over the silicon substrate, wherein the first monocrystalline semiconductor layer has a lattice constant different from a lattice constant of relaxed silicon. The semiconductor structure further includes an insulating layer disposed over the first monocrystalline semiconductor layer in a first region, a monocrystalline silicon layer disposed over the insulating layer in the first region, and a second monocrystalline semiconductor layer disposed over at least a portion of the first monocrystalline semiconductor layer in a second region and absent from the first region. The second monocrystalline semiconductor layer has a lattice constant different from the lattice constant of relaxed silicon.
Researchers
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monolithically integrated semiconductor materials and devices
United States of America | Granted | 8,012,592 -
monolithically integrated semiconductor materials and devices
Korea (south) | Granted | 10 -
monolithically integrated semiconductor materials and devices
Japan | Granted | 5,243,256 -
monolithically integrated semiconductor materials and devices
China | Granted | 0 -
monolithically integrated light emitting devices
United States of America | Granted | 7,535,089 -
monolithically integrated photodetectors
United States of America | Granted | 7,705,370 -
monolithically integrated silicon and iii-v electronics
United States of America | Granted | 8,120,060
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