Ultrafast Line Scanning Temporally Focused Two-Photon Lithography System and ImpFab Methods for 3D Nano-Fabrication

The present invention presents improved systems and methods for performing multi-photon lithography. A line-scanning temporally focused two-photon lithography (LS-TFTPL) technique is capable of patterning three-dimensional structures with high throughput. An example LS-TFTPL system may include a pulsed laser, first optical components for expanding light pulses into an elongated or line cross section, a digital micromirror device for modulating the light pulses with a linear pattern and dispersing spectral components of the modulated light pulses, and second optical components for focusing the dispersed spectral components of the modulated light pulse at a line in or on a target material. The focused spectral components may alter the target material within selected voxels along the line, where the selected voxels spatially correspond to the linear pattern.