Programmable Nanolithography Mask

Conventional optical lithography uses masks with static patterns that are expensive and labor intensive to produce. The present disclosure is directed to a programmable optical lithography mask with an array of cells that use a hydrogen-mediated mechanism to tune their optical properties (e.g., transmission, absorption, refractive index, and/or reflectivity) dynamically and reversibly. Each cell in the programmable mask may be individually addressable to produce a large variety of patterns. The programmable mask may be configured for ultra-fine spatial resolution or coarse spatial resolution, facilitating a wide range of applications. The programmable mask may be stable against short wavelength light, such as broadband ultraviolet (UV) light, and can thus act as a light valve for short wavelength light.