Defect-Free Epitaxy on Amorphous Substrate using Confined Two-Dimensional Materials Growth and Manufacturing Method Thereof
Invention type: Technology
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Case number: #25561
Researchers
Departments: Department of Mechanical Engineering, Research Laboratory of Electronics
Technology Areas: Chemicals & Materials: Composites / Industrial Engineering & Automation: Manufacturing & Equipment
Impact Areas: Connected World
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epitaxial growth of crystalline materials using confined directional growth and related articles and systems
United States of America | Pending
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