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Robotic Liquid Crystal Elastomer Fabrics

Technology / Case number: #25474X
Jack Forman / Ozgun Kilic Afsar / Sarah Nicita / Rosalie Lin / Cedric Honnet / Neil Gershenfeld / Hiroshi Ishii
Technology Areas: Chemicals & Materials / Industrial Engineering & Automation
Impact Areas: Sustainable Future, Advanced Materials
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High-Performance Mono-Material Hybrid Yarns for Circular Sustainable Textiles and Soft Robotics

Technology / Case number: #23876
Svetlana Boriskina / Volodymyr Korolovych
Technology Areas: Chemicals & Materials / Industrial Engineering & Automation
Impact Areas: Sustainable Future, Advanced Materials
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The Mods Project

Software / Case number: #18970X
Neil Gershenfeld
Technology Areas: Chemicals & Materials / Environmental Engineering / Industrial Engineering & Automation
Impact Areas: Sustainable Future
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Curbside-recyclable Products from Mono-material Polyethylene Fabrics With Polyethylene 3D Printed Features and Methods Thereof

Technology / Case number: #24436
Svetlana Boriskina / Volodymyr Korolovych / Leslie Yan / Duo Xu
Technology Areas: Chemicals & Materials / Environmental Engineering
Impact Areas: Sustainable Future, Advanced Materials
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iCVD Technique for Durable Water Resistant Coatings

Technology / Case number: #18029
Dan Soto / Asli Ugur Katmis / Karen Gleason / Kripa Varanasi
Technology Areas: Chemicals & Materials / Environmental Engineering
Impact Areas: Sustainable Future, Advanced Materials
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Additive Manufacturing of Fabrics with Digitally Tailored Mechanical Properties

Technology / Case number: #18019
Sebastian Pattinson / Anastasios Hart
Technology Areas: Biomaterials & Bioelectronics / Chemicals & Materials / Industrial Engineering & Automation
Impact Areas: Healthy Living, Sustainable Future
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Pre-Stretched & Constrained Transformable Textiles

Technology / Case number: #17769
Skylar Tibbits / Athina Papadopoulou / David Costanza / Christophe Guberan
Technology Areas: Chemicals & Materials
Impact Areas: Sustainable Future, Advanced Materials
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The technologies listed represent a selection of the MIT intellectual property protected by the TLO.

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