Processes, Systems and Devices for Metal-Filling of Spiral-Grooved, Non-Insulated Superconducting Magnets or Other Open HTS Channels

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Described are concepts, systems, structures and techniques for metal filling an open channel in a baseplate. In embodiments, metal filling of an open baseplate channel is achieved using vacuum pressure impregnation. In embodiments, a compression plate is disposed over an open baseplate channel to be filled with a molten metal. In embodiments, gaskets (97) are disposed between the compression plate and a surface of the baseplate proximate the baseplate channel. In embodiments, a channel cap is disposed over the open channel. In embodiments, the channel cap has a solder flow channel provided in a surface thereof. In the embodiments, the solder flow channel has a meandering shape. In embodiments, a solder flow channel is provided in the compression plate and/or the baseplate.

Researchers

Brian Labombard / Kenneth Stevens / Sarah Chamberlain / Amy Watterson / Shane Schweiger / Vincent Fry / Thomas Toland / Amanda Hubbard / William Beck / Rui Vieira / James Irby / Theodore Mouratidis / Jose Estrada / Richard Murray

Departments: Plasma Science and Fusion Center
Technology Areas: Chemicals & Materials: Composites, Metals / Electronics & Photonics: Quantum Technology / Energy & Distribution: Electrochemical Devices / Industrial Engineering & Automation: Manufacturing & Equipment

  • processes, systems and devices for metal-filling of open hts channels
    United States of America | Published application
  • processes, systems and devices for metal-filling of open hts channels
    Canada | Published application
  • processes, systems and devices for metal-filling of open hts channels
    European Patent Convention | Published application
  • processes, systems and devices for metal-filling of open hts channels
    Japan | Published application
  • processes, systems and devices for metal-filling of open hts channels
    Korea (south) | Published application

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