Method of Forming Topcoat for Patterning
Invention type: Technology
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Case number: #18405QJ
Researchers
Priya Moni
/ Do Han Kim
/ Paul Nealey
/ Hyo Seon Suh
/ Karen Gleason
Departments: Department of Chemical Engineering
Technology Areas: Chemicals & Materials: Nanotechnology & Nanomaterials, Polymers / Electronics & Photonics: Semiconductors
Impact Areas: Advanced Materials
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method of forming topcoat for patterning
United States of America | Granted | 10,755,942
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