Epitaxial Growth Template Using Carbon Buffer on Sublimated SiC Substrate (Pseudo Graphene)
Apparatus, systems, and methods for forming semiconductor materials (e.g., using nanofabrication) are generally described. In one example, a method comprises formation of a carbon buffer layer on a first substrate and a graphene layer on the carbon buffer layer, followed by removing the graphene layer so as to expose the carbon buffer layer and form a fabrication platform, and after removing the graphene layer, forming a first epitaxial layer directly on the carbon buffer layer covalently bonded to the first substrate, wherein the first epitaxial layer comprises a semiconductor. In one example, a method comprises forming an epitaxial layer directly on a carbon buffer layer that is covalently bonded to a substrate, wherein the epitaxial layer comprises a semiconductor, and wherein the carbon buffer layer is a pseudo-graphene layer.
Researchers
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epitaxial growth template using carbon buffer on sublimated sic substrate
United States of America | Granted | 12,308,227 -
epitaxial growth using carbon buffer on substrate
United States of America | Pending -
epitaxial growth template using carbon buffer on sublimated sic substrate
China | Published application -
epitaxial growth template using carbon buffer on sublimated sic substrate
European Patent Convention | Published application -
epitaxial growth template using carbon buffer on sublimated sic substrate
Japan | Granted | 7,689,371 -
epitaxial growth template using carbon buffer on sublimated sic substrate
Korea (south) | Published application
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