Epitaxial Growth Template Using Carbon Buffer on Sublimated SiC Substrate (Pseudo Graphene)

Apparatus, systems, and methods for forming semiconductor materials (e.g., using nanofabrication) are generally described. In one example, a method comprises formation of a carbon buffer layer on a first substrate and a graphene layer on the carbon buffer layer, followed by removing the graphene layer so as to expose the carbon buffer layer and form a fabrication platform, and after removing the graphene layer, forming a first epitaxial layer directly on the carbon buffer layer covalently bonded to the first substrate, wherein the first epitaxial layer comprises a semiconductor. In one example, a method comprises forming an epitaxial layer directly on a carbon buffer layer that is covalently bonded to a substrate, wherein the epitaxial layer comprises a semiconductor, and wherein the carbon buffer layer is a pseudo-graphene layer.

Researchers

Jeehwan Kim / Wei Kong

Departments: Department of Mechanical Engineering
Technology Areas: Chemicals & Materials: Nanotechnology & Nanomaterials / Electronics & Photonics: Semiconductors
Impact Areas: Advanced Materials

  • epitaxial growth template using carbon buffer on sublimated sic substrate
    United States of America | Granted | 12,308,227
  • epitaxial growth using carbon buffer on substrate
    United States of America | Pending
  • epitaxial growth template using carbon buffer on sublimated sic substrate
    China | Published application
  • epitaxial growth template using carbon buffer on sublimated sic substrate
    European Patent Convention | Published application
  • epitaxial growth template using carbon buffer on sublimated sic substrate
    Japan | Granted | 7,689,371
  • epitaxial growth template using carbon buffer on sublimated sic substrate
    Korea (south) | Published application

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