Alternating Multi-Source Vapor Transport Deposition Method
Exclusively Licensed
Invention type: Technology
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Case number: #19992
Disclosed are vapor transport deposition systems and methods for alternating sequential vapor transport deposition of multi-component perovskite thin-films. The systems include multiple vaporizing sources that are mechanically or digitally controlled for high throughput deposition. Alternating sequential deposition provides faster sequential deposition, and allows for reduced material degradation due to different vapor temperatures.
Researchers
Vladimir Bulovic
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Maximilian Hoerantner
Departments: Office of the Vice President for Research
Technology Areas: Chemicals & Materials: Catalysis & Synthesis, Nanotechnology & Nanomaterials / Electronics & Photonics: Semiconductors / Energy & Distribution: Photovoltaics / Industrial Engineering & Automation: Manufacturing & Equipment
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alternating multi-source vapor transport deposition method
European Patent Convention | Published application -
alternating multi-source vapor transport deposition method
United States of America | Granted | 11,629,405 -
alternating multi-source vapor transport deposition
United States of America | Published application
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