3-D Photoresist via Functionalization of Polymer Thin Films Fabricated by Initiated Chemical Vapor Deposition (iCVD)
Invention type: Technology
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Case number: #15496
Disclosed are simple, efficient, and scalable methods of patterning polymeric or metallic microstructures on planar or non-planar surfaces. The methods utilize initiated chemical vapor deposition (iCVD) technology. Also disclosed are patterned articles produced by these methods, and methods of using the articles.
Researchers
Christy Petruczok
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Karen Gleason
Departments: Department of Chemical Engineering
Technology Areas: Chemicals & Materials: Nanotechnology & Nanomaterials, Polymers / Industrial Engineering & Automation: Manufacturing & Equipment
Impact Areas: Advanced Materials
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three-dimensional photoresist via functionalization of polymer thin films fabricated by icvd
United States of America | Granted | 9,163,307
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