3-D Photoresist via Functionalization of Polymer Thin Films Fabricated by Initiated Chemical Vapor Deposition (iCVD)

Disclosed are simple, efficient, and scalable methods of patterning polymeric or metallic microstructures on planar or non-planar surfaces. The methods utilize initiated chemical vapor deposition (iCVD) technology. Also disclosed are patterned articles produced by these methods, and methods of using the articles.

Researchers

Christy Petruczok / Karen Gleason

Departments: Department of Chemical Engineering
Technology Areas: Chemicals & Materials: Nanotechnology & Nanomaterials, Polymers / Industrial Engineering & Automation: Manufacturing & Equipment
Impact Areas: Advanced Materials

  • three-dimensional photoresist via functionalization of polymer thin films fabricated by icvd
    United States of America | Granted | 9,163,307

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