Metal oxynitride deposition using high-base pressure reactive magnetron sputtering
Invention type: Technology
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Case number: #23739
Researchers
Departments: Department of Materials Science and Engineering
Technology Areas: Chemicals & Materials: Metals, Nanotechnology & Nanomaterials / Industrial Engineering & Automation: Manufacturing & Equipment
Impact Areas: Advanced Materials
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metal oxynitride deposition using high-base pressure reactive magnetron sputtering
Patent Cooperation Treaty | Published application
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