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Dewetting of thin films as a positive tone process through a variety of focused laser spike (FLaSK) annealing techniques is a relatively nascent technique and has only really begun to show its potential for development-free positive tone patterning of 1D or, barring overlap, 2D structures. As currently presented, it exists in two distinct forms: (1) patterning of isolated trench-ridge lines near the optical limit, and (2) patterning of subwavelength lines by overlapping the exposures. While capability (2) is more exotic, capability (1) should not be diminished; submicron 2D structures in a method that requires no developer step and only uses inexpensive, commodity polymers, free space optics, and visible (sub watt) lasers could be a potentially competitive process, especially for industrial scale fabrication tools where price is a critical concern.