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The current technology proposes a method of applying PEDOT to graphene using oxidative chemical vapor deposition, where an unmodified graphene surface is exposed to a vaporized monomer and an oxidizing agent. This method involves a low temperature, moderate pressure and no use of solvents, meaning that the graphene material and its properties are not compromised in the process. The methodology can be applied to graphene films that have been fabricated either by low pressure chemical vapor deposition (LPCVD) or atmospheric chemical vapor deposition (APVCD).