The synthesis of high-quality LTMD monolayers remains a great challenge. Additionally, a robust transfer technique to avoid degradation in quality and contamination is essential for fundamental physics and optoelectronic applications. The inventors directly synthesize high-quality MS2 monolayers on various surfaces using a scalable APCVD process and seeding techniques. Not only is the growth successful for surfaces of different materials but the deposition is applicable for surfaces with various morphology. The as-synthesized MS2 monolayer exhibits single crystalline structure with a specific flake shape even on amorphous surfaces.